• 文献标题:   High temperature and current density induced degradation of multi-layer graphene
  • 文献类型:   Article
  • 作  者:   WANG BM, HAQUE MA, MAGISA AE, KIM JH, LEE HJ
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Penn State Univ
  • 被引频次:   2
  • DOI:   10.1063/1.4934260
  • 出版年:   2015

▎ 摘  要

We present evidence of moderate current density, when accompanied with high temperature, promoting migration of foreign atoms on the surface of multi-layer graphene. Our in situ transmission electron microscope experiments show migration of silicon atoms at temperatures above 800 degrees C and current density around 4.2 x 10(7) A/cm(2). Originating from the micro-machined silicon structures that clamp the freestanding specimen, the atoms are observed to react with the carbon atoms in the multi-layer graphene to produce silicon carbide at temperatures of 900-1000 degrees C. In the absence of electrical current, there is no migration of silicon and only pyrolysis of polymeric residue is observed. (C) 2015 AIP Publishing LLC.