• 文献标题:   Impact of Contact Configuration on Contact Resistance in Ultranarrow Graphene Nanoribbon Devices
  • 文献类型:   Article
  • 作  者:   POLJAK M, MATIC M, ZELJKO A
  • 作者关键词:   field effect transistor, contact resistance, integrated circuit, graphene, metal, photonic band gap, nanoscale device, atomistic simulation, contact configuration, contact resistance, edge contact, graphene nanoribbon gnr, nonequilibrium green s function negf, quantum transport, top contact
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:   10.1109/TED.2022.3188957 EA JUL 2022
  • 出版年:   2022

▎ 摘  要

Contact resistance strongly deteriorates the performance of devices based on 2-D materials and their nanostructures, masking their exceptional electronic and transport properties. This work explores the dependence of contact resistance (R-C) of graphene nanoribbon (GNR) devices on contact geometry using atomistic quantum transport simulations. The influence and contributions of edge and top contacts and GNR width scaling on R-C is studied in detail. Metallization effects on the density of states, transmission, and GNR field-effect transistor (GNR FET) driving current are investigated. We show that wider GNRs (similar to 4 nm) exhibit edge-dominated transport and lower R-C than the ultranarrow GNRs (similar to 0.4 nm) that exhibit much higher contact resistance which is also dependent on the contact area.