• 文献标题:   Rapid thermal annealing of graphene-metal contact
  • 文献类型:   Article
  • 作  者:   BALCI O, KOCABAS C
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Bilkent Univ
  • 被引频次:   45
  • DOI:   10.1063/1.4769817
  • 出版年:   2012

▎ 摘  要

High quality graphene-metal contacts are desirable for high-performance graphene based electronics. Process related factors result large variation in the contact resistance. A post-processing method is needed to improve graphene-metal contacts. In this letter, we studied rapid thermal annealing (RTA) of graphene-metal contacts. We present results of a systematic investigation of device scaling before and after RTA for various metals. The results reveal that RTA provides a convenient technique to reduce contact resistance, thus to obtain reproducible device operation. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4769817]