• 文献标题:   Are Al2O3 and MgO tunnel barriers suitable for spin injection in graphene?
  • 文献类型:   Article
  • 作  者:   DLUBAK B, SENEOR P, ANANE A, BARRAUD C, DERANLOT C, DENEUVE D, SERVET B, MATTANA R, PETROFF F, FERT A
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   CNRS Thales
  • 被引频次:   63
  • DOI:   10.1063/1.3476339
  • 出版年:   2010

▎ 摘  要

We report on the structural impact on graphene and multi-layers graphene of the growth by sputtering of tunnel barriers. Sputtered Al2O3 and MgO barriers were chosen for their well-known efficiency as spin injectors in spintronics devices. The impact of the growth on the structure of graphene and up to 4-layer flakes was analyzed by Raman. spectroscopy. This study reveals that for Al2O3 growth, the impact is moderate for a monolayer and decreases sharply for bilayers and above. In the case of MgO all the flakes underwent a strong amorphization. Moreover, this reveals that while single layer graphene is believed to offer the best spin transport properties, the better robustness of multilayer graphene may ultimately make it a better choice for spintronics devices. (C) 2010 American Institute of Physics. [doi:10.1063/1.3476339]