• 文献标题:   The Influence of Copper Substrates on Irradiation Effects of Graphene: A Molecular Dynamics Study
  • 文献类型:   Article
  • 作  者:   WANG SL, ZHANG Q, YIN K, GAO B, ZHANG SY, WANG GP, LIU HX
  • 作者关键词:   graphene, copper substrate, md simulation, defect
  • 出版物名称:   MATERIALS
  • ISSN:   1996-1944
  • 通讯作者地址:   Xidian Univ
  • 被引频次:   1
  • DOI:   10.3390/ma12020319
  • 出版年:   2019

▎ 摘  要

In this paper, classical molecular dynamics simulations are conducted to study the graphene grown on copper substrates under ion beam irradiation, in which the emphasis is put on the influence copper substrate on a single graphene layer. It can be inferred that the actual transmission and distribution of kinetic energy from incident ion play important roles in irradiation-defects forming process together. The minimum value needed to generate defects in supported graphene is higher than 2.67 keV, which is almost twice the damage threshold as the suspended graphene sheet. This work indicates the presence of copper substrate increases the damage threshold of graphene. Additionally, our results provide an atomistic explanation for the graphene with copper substrate under ion irradiation, which is very important for engineering graphene.