▎ 摘　　要

The site-specific fabrication of metal-incorporated graphitic microporous carbon terminated by highly ordered multilayer graphene walls via an ambient-temperature vacuum-based process is presented for the first time. Sputtering of Cr nano-particles on the ultrathin amorphous carbon film manifests a dual effect of activation via dry-etching by the sputtering plasma and of knock-on' inelastic collision between nanoparticles and C atoms for structural ordering. This novel and simple method is very useful for fabricating high surface area carbon nanostructures for hydrogen storage and clean energy applications. ((c) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)