• 文献标题:   Scanning tunneling spectroscopy of van der Waals graphene/semiconductor interfaces: absence of Fermi level pinning
  • 文献类型:   Article
  • 作  者:   LE QUANG T, CHERKEZ V, NOGAJEWSKI K, POTEMSKI M, DAU MT, JAMET M, MALLET P, VEUILLEN JY
  • 作者关键词:   scanning tunneling microscopy/spectroscopy, van der waals heterostructure, schottkymott model, schottky barrier height, graphene, tmd
  • 出版物名称:   2D MATERIALS
  • ISSN:   2053-1583
  • 通讯作者地址:   Univ Grenoble Alpes
  • 被引频次:   8
  • DOI:   10.1088/2053-1583/aa7b03
  • 出版年:   2017

▎ 摘  要

We have investigated the electronic properties of two-dimensional (2D) transition metal dichalcogenides (TMDs), namely trilayer WSe2 and monolayer MoSe2, deposited on epitaxial graphene on silicon carbide, by using scanning tunneling microscopy and spectroscopy (STM/STS) in ultra-high vacuum. Depending on the number of graphene layers below the TMD flakes, we identified variations in the electronic dI/dV(V) spectra measured by the STM tip: the most salient feature is a rigid shift of the TMD spectra (i.e. of the different band onset positions) towards occupied states by about 120 mV when passing from bilayer to monolayer underlying graphene. Since both graphene phases are metallic and present a work function difference in the same energy range, our measurements point towards the absence of Fermi-level pinning for such van der Waals 2D TMD/Metal heterojunctions, following the prediction of the Schottky-Mott model.