• 文献标题:   Precision quantization of Hall resistance in transferred graphene
  • 文献类型:   Article
  • 作  者:   WOSZCZYNA M, FRIEDEMANN M, GOTZ M, PESEL E, PIERZ K, WEIMANN T, AHLERS FJ
  • 作者关键词:   chemical vapour deposition, gallium arsenide, graphene, hall effect, iiiv semiconductor, quantisation quantum theory
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Phys Tech Bundesanstalt
  • 被引频次:   23
  • DOI:   10.1063/1.4704190
  • 出版年:   2012

▎ 摘  要

We show that quantum resistance standards made of transferred graphene reach the uncertainty of semiconductor devices, the current reference system in metrology. A large graphene device (150 x 30 mu m(2)), exfoliated and transferred onto GaAs revealed a quantization with a precision of (-5.1 +/- 6.3) . 10(-9) accompanied by a vanishing longitudinal resistance at current levels exceeding 10 mu A. While such performance had previously only been achieved with epitaxially grown graphene, our experiments demonstrate that transfer steps, inevitable for exfoliated graphene or graphene grown by chemical vapor deposition, are compatible with the requirements of high quality quantum resistance standards. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4704190]