• 文献标题:   Histogram method for reliable thickness measurements of graphene films using atomic force microscopy (AFM)
  • 文献类型:   Article
  • 作  者:   YAO YX, REN LL, GAO ST, LI S
  • 作者关键词:   graphene, thickness measurement, atomic force microscopy, histogram method
  • 出版物名称:   JOURNAL OF MATERIALS SCIENCE TECHNOLOGY
  • ISSN:   1005-0302
  • 通讯作者地址:   Natl Inst Metrol
  • 被引频次:   7
  • DOI:   10.1016/j.jmst.2016.07.020
  • 出版年:   2017

▎ 摘  要

Atomic force microscopy (AFM) is a commonly used technique for graphene thickness measurement. However, due to surface roughness caused by graphene itself and variation introduced in AFM measurement, graphene thickness is difficult to be accurately determined by AFM. In this paper, a histogram method was used for reliable measurements of graphene thickness using AFM. The influences of various measurement parameters in AFM analysis were investigated. The experimental results indicate that significant deviation can be introduced using various order of flatten and improperly selected measurement parameters including amplitude setpoint and drive amplitude. At amplitude setpoint of 100 mV and drive amplitude of 100 mV, thickness of 1 layer (1L), 2 layers (2L) and 4 layers (4L) graphene were measured. The height differences for 1L, 2L and 4L were 1.51 +/- 0.16 nm, 1.92 +/- 0.13 nm and 2.73 +/- 0.10 nm, respectively. By comparing these values, thickness of single layer graphene can be accurately determined to be 0.41 +/- 0.09 nm. (C) 2017 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.