• 文献标题:   Resistance switching behavior of ZnO resistive random access memory with a reduced graphene oxide capping layer
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   LIN CL, CHANG WY, HUANG YL, JUAN PC, WANG TW, HUNG KY, HSIEH CY, KANG TK, SHI JB
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922 EI 1347-4065
  • 通讯作者地址:   Feng Chia Univ
  • 被引频次:   6
  • DOI:   10.7567/JJAP.54.04DJ08
  • 出版年:   2015

▎ 摘  要

In this work, we investigate the characteristics of ZnO resistive random access memory (RRAM) with a reduced graphene oxide (rGO) capping layer and the polarity effect of the SET/RESET bias on the RRAM. The rGO film insertion enhances the stability of the current-voltage (I-V) switching curve and the superior resistance ratio (similar to 10(5)) of high-resistance state (HRS) to low-resistance state (LRS). Using the appropriate polarity of the SET/RESET bias applied to the rGO-capped ZnO RRAM enables the oxygen ions to move mainly at the interface of the rGO and ZnO films, resulting in the best performance. Presumably, the rGO film acts as an oxygen reservoir and enhances the easy in and out motion of the oxygen ions from the rGO film. The rGO film also prevents the interaction of oxygen ions and the Al electrode, resulting in excellent performance. In a pulse endurance test, the rGO-capped ZnO RRAM reveals superior endurance of up to 10(8) cycles over that of the ZnO RRAM without rGO insertion (10(6) cycles). (C) 2015 The Japan Society of Applied Physics