• 文献标题:   Graphene oxide-based micropatterns via high-throughput multiphoton-induced reduction and ablation
  • 文献类型:   Article
  • 作  者:   LI YC, YEH TF, HUANG HC, CHANG HY, LIN CY, CHENG LC, CHANG CY, TENG HS, CHEN SJ
  • 作者关键词:  
  • 出版物名称:   OPTICS EXPRESS
  • ISSN:   1094-4087
  • 通讯作者地址:   Natl Cheng Kung Univ
  • 被引频次:   8
  • DOI:   10.1364/OE.22.019726
  • 出版年:   2014

▎ 摘  要

In this study, a developed temporal focusing-based femtosecond laser system provides high-throughput multiphoton-induced reduction and ablation of graphene oxide (GO) films. Integrated with a digital micromirror device to locally control the laser pulse numbers, GO-based micropatterns can be quickly achieved instantly. Furthermore, the degree of reduction and ablation can be precisely adjusted via controlling the laser wavelength, power, and pulse number. Compared to point-by-point scanning laser direct writing, this approach offers a high-throughput and multiple-function approach to accomplish a large area of micro-scale patterns on GO films. The high-throughput micropatterning of GO via the temporal focusing-based femtosecond laser system fulfills the requirement of mass production for GO-based applications in microelectronic devices. (C) 2014 Optical Society of America