• 文献标题:   Toward clean suspended CVD graphene
  • 文献类型:   Article
  • 作  者:   YULAEV A, CHENG GJ, WALKER ARH, VLASSIOUK IV, MYERS A, LEITE MS, KOLMAKOV A
  • 作者关键词:  
  • 出版物名称:   RSC ADVANCES
  • ISSN:   2046-2069
  • 通讯作者地址:   NIST
  • 被引频次:   6
  • DOI:   10.1039/c6ra17360h
  • 出版年:   2016

▎ 摘  要

The application of suspended graphene as electron transparent supporting media in electron microscopy, vacuum electronics, and micromechanical devices requires the least destructive and maximally clean transfer from their original growth substrate to the target of interest. Here, we use thermally evaporated anthracene films as the sacrificial layer for graphene transfer onto an arbitrary substrate. We show that clean suspended graphene can be achieved via desorbing the anthracene layer at temperatures in the 100 degrees C to 150 degrees C range, followed by two sequential annealing steps for the final cleaning, using a Pt catalyst and activated carbon. The cleanliness of the suspended graphene membranes was analyzed employing the high surface sensitivity of low energy scanning electron microscopy and X-ray photoelectron spectroscopy. A quantitative comparison with two other commonly used transfer methods revealed the superiority of the anthracene approach to obtain a larger area of clean, suspended CVD graphene. Our graphene transfer method based on anthracene paves the way for integrating cleaner graphene in various types of complex devices, including the ones that are heat and humidity sensitive.