• 文献标题:   Partial Dislocations in Graphene and Their Atomic Level Migration Dynamics
  • 文献类型:   Article
  • 作  者:   ROBERTSON AW, LEE GD, HE K, FAN Y, ALLEN CS, LEE S, KIM H, YOON E, ZHENG HM, KIRKLAND AI, WARNER JH
  • 作者关键词:   graphene, tem, dislocation, defect
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Oxford
  • 被引频次:   25
  • DOI:   10.1021/acs.nanolett.5b02080
  • 出版年:   2015

▎ 摘  要

We demonstrate the formation of partial dislocations in graphene at elevated temperatures of >= 500 degrees C with single atom resolution aberration corrected transmission electron microscopy. The partial dislocations spatially redistribute strain in the lattice, providing an energetically more favorable configuration to the perfect dislocation. Low-energy migration paths mediated by partial dislocation formation have been observed, providing insights into the atomistic dynamics of graphene during annealing. These results are important for understanding the high temperature plasticity of graphene and partial dislocation behavior in related crystal systems, such as diamond cubic materials.