• 文献标题:   High-Quality Graphene p-n Junctions via Resist-free Fabrication and Solution-Based Noncovalent Functionalization
  • 文献类型:   Article
  • 作  者:   CHENG HC, SHIUE RJ, TSAI CC, WANG WH, CHEN YT
  • 作者关键词:   graphene, resistfree fabrication, surface potential, raman imaging, pn junction, quantum hall effect
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Acad Sinica
  • 被引频次:   62
  • DOI:   10.1021/nn103221v
  • 出版年:   2011

▎ 摘  要

An essential issue in graphene nanoelectronics is to engineer the carrier type and density and still preserve the unique band structure of graphene. We report the realization of high-quality graphene p-n junctions by noncovalent chemical functionalization. A generic scheme for the graphene p-n junction fabrication is established by combining the resist-free approach and spatially selective chemical modification process. The effectiveness of the chemical functionalization is systematically confirmed by surface topography and potential measurements, spatially resolved Raman spectroscopic imaging, and transport/magnetotransport measurements. The transport characteristics of graphene p-n junctions are presented with observations of high carrier mobilities, Fermi energy difference, and distinct quantum Hall plateaus. The chemical functionalization of graphene p-n junctions demonstrated in this study is believed to be a feasible scheme for modulating the doping level in graphene for future graphene-based nanoelectronics.