• 文献标题:   Chirality-dependent phonon-limited resistivity in multiple layers of graphene
  • 文献类型:   Article
  • 作  者:   MIN HK, HWANG EH, DAS SARMA S
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Univ Maryland
  • 被引频次:   29
  • DOI:   10.1103/PhysRevB.83.161404
  • 出版年:   2011

▎ 摘  要

We develop a theory for the temperature and density dependence of phonon-limited resistivity rho(T) in bilayer and multilayer graphene and compare with the corresponding monolayer result. For the unscreened case, we find rho approximate to CT with C proportional to v(F)(-2) in the high-temperature limit, and rho approximate to AT(4) with A proportional to v(F)(-2)k(F)(-3) in the low-temperature Bloch-Gruneisen limit, where v(F) and k(F) are Fermi velocity and Fermi wave vector, respectively. If screening effects are taken into account, rho approximate to CT in the high-temperature limit with a renormalized C, which is a function of the screening length, and rho approximate to AT(6) in the low-temperature limit with A proportional to k(F)(-5) but independent of v(F). These relations hold in general with v(F) and a chiral factor in C determined by the specific chiral band structure for a given density.