• 文献标题:   Formation of graphene on SiC by chemical vapor deposition with liquid sources
  • 文献类型:   Article
  • 作  者:   KIM JG, KIM WS, KIM YH, LIM CH, CHOI DJ
  • 作者关键词:   graphene, graphene oxide go, silicon carbide sic, chemical vapor deposition cvd, toluenebased liquid source, xylenebased liquid source
  • 出版物名称:   SURFACE COATINGS TECHNOLOGY
  • ISSN:   0257-8972
  • 通讯作者地址:   Yonsei Univ
  • 被引频次:   5
  • DOI:   10.1016/j.surfcoat.2012.06.066
  • 出版年:   2013

▎ 摘  要

Many studies of graphene and graphene oxide (GO) have been conducted due to their excellent chemical, mechanical and electrical properties and wide potential applications, and various methods are used to fabricate them. In this study, we grew graphene on silicon carbide (SiC) substrates by chemical vapor deposition (CVD) using toluene- and xylene-based liquid sources. Raman spectroscopy and TEM analysis confirmed the growth of graphene on SiC substrates when toluene was used and revealed that GO grew when xylene was used. The mechanism of the formation of GO and graphene from the different liquid sources was examined, and the change in thickness and electrical conductivity observed when graphene and GO were reduced through heat treatment was also evaluated. (C) 2012 Elsevier B.V. All rights reserved.