• 文献标题:   Investigation on tunable electronic properties of semiconducting graphene induced by boron and sulfur doping
  • 文献类型:   Article
  • 作  者:   QU YF, DING JJ, FU HW, CHEN HX, PENG JH
  • 作者关键词:   graphene, boron sulfur doping, electronic propertie, doping effect, adsorption propertie
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:  
  • 被引频次:   16
  • DOI:   10.1016/j.apsusc.2020.148763
  • 出版年:   2021

▎ 摘  要

The density functional theory (DFT) simulation is performed to systematically investigate the doping effect of the boron (B) and sulfur (S) atoms on the electronic and adsorption properties of graphene. B and S atom doping provide the means of regulating the electronic properties of graphene. Most interesting, semiconducting graphene induced by B and S doping is achieved, including the observation that the bandgap of graphene can be opened and graphene can be modulated to form the n- and p-type nature. The doping effect of graphene is determined by B and S atom ratio. In detail, when the B to S ratio is less than 2, graphene shows n-type. Conversely, it exhibits a p-type conductivity. Meanwhile, simulations reveal the crucial role played by the vacancy defects in graphene leading to p-type nature. The increasing S atom doping around the vacant site can cause the transformation behavior of graphene from p to n-type. Our work focus on the synergistic effect of B and S doping on the electronic properties and adsorption properties of graphene. Results indicate that B and S doping offers a new possibility of tuning the electronic and adsorption properties of graphene at the atomic level, providing guidance for future homogeneous p-n junction design used in the advanced nanoelectronic devices.