• 文献标题:   Model of tunneling transistors based on graphene on SiC
  • 文献类型:   Article
  • 作  者:   MICHETTI P, CHELI M, IANNACCONE G
  • 作者关键词:   energy gap, epitaxial growth, epitaxial layer, field effect transistor, graphene, nanoelectronic, silicon compound, wide band gap semiconductor
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Pisa
  • 被引频次:   26
  • DOI:   10.1063/1.3361657
  • 出版年:   2010

▎ 摘  要

Recent experiments shown that graphene epitaxially grown on Silicon carbide (SiC) can exhibit a energy gap of 0.26 eV, making it a promising material for electronics. With an accurate model, we explore the design parameter space for a fully ballistic graphene-on-SiC tunnel field-effect transistors, and assess the dc and high frequency figures of merit. The steep subthreshold behavior can enable I-ON/I-OFF ratios exceeding 10(4) even with a low supply voltage of 0.15 V, for devices with gatelength down to 30 nm. Intrinsic transistor delays smaller than 1 ps are obtained. These factors make the device an interesting candidate for low-power nanoelectronics beyond CMOS.