• 文献标题:   Scanning tunneling microscope study of striated carbon ridges in few-layer epitaxial graphene formed on 4H-silicon carbide (0001)
  • 文献类型:   Article
  • 作  者:   HARRISON SE, CAPANO MA, REIFENBERGER R
  • 作者关键词:   elemental semiconductor, graphene, scanning tunnelling microscopy, semiconductor epitaxial layer
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Purdue Univ
  • 被引频次:   12
  • DOI:   10.1063/1.3323092
  • 出版年:   2010

▎ 摘  要

Atomically resolved scanning tunneling microscope images of carbon ridge defects found in few-layer graphene formed on the C-face (0001) of 4H-silicon carbide reveal a striated exterior surface formed from out-of-plane distortions of the hexagonal graphene lattice. While ridge formation is likely explained by compressive in-plane stresses coupled with the small values of the bending modulus for few-layer graphene, the striated structure along the ridges argues for a localized unidirectional stress in the material directed along the ridge length.