• 文献标题:   Photoinduced molecular desorption from graphene films
  • 文献类型:   Article
  • 作  者:   SUN PZ, ZHU M, WANG KL, ZHONG ML, WEI JQ, WU DH, CHENG Y, ZHU HW
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Tsinghua Univ
  • 被引频次:   23
  • DOI:   10.1063/1.4742147
  • 出版年:   2012

▎ 摘  要

Photoinduced molecular desorption from solid surfaces will modify the electrical transporting properties of matter and result in significant change in resistance. The UV induced resistive response of graphene films prepared by chemical vapor deposition was investigated. The resistance of graphene increased exponentially upon UV irradiation and decreased also in an exponential form when the UV light was turned off. Both processes exhibited large time constants of hundreds of seconds. UV-induced molecular desorption mechanisms for graphene, carbon nanotubes, and reduced graphene oxides were compared and discussed. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4742147]