• 文献标题:   Toward Large-Scale Ga2O3 Membranes via Quasi-Van Der Waals Epitaxy on Epitaxial Graphene Layers
  • 文献类型:   Article
  • 作  者:   MIN JH, LI KH, KIM YH, MIN JW, KANG CH, KIM KH, LEE JS, LEE KJ, JEONG SM, LEE DS, BAE SY, NG TK, OOI BS
  • 作者关键词:   membrane, epitaxial graphene, van der waals epitaxy, ga2o3, energy release rate, solarblind photodetector
  • 出版物名称:   ACS APPLIED MATERIALS INTERFACES
  • ISSN:   1944-8244 EI 1944-8252
  • 通讯作者地址:  
  • 被引频次:   9
  • DOI:   10.1021/acsami.1c01042 EA MAR 2021
  • 出版年:   2021

▎ 摘  要

Epitaxial growth using graphene (GR), weakly bonded by van der Waals force, is a subject of interest for fabricating technologically important semiconductor membranes. Such membranes can potentially offer effective cooling and dimensional scale-down for high voltage power devices and deep ultraviolet optoelectronics at a fraction of the bulk-device cost. Here, we report on a large-area beta-Ga2O3 nanomembrane spontaneous-exfoliation (1 cm x 1 cm) from layers of compressive-strained epitaxial graphene (EG) grown on SiC, and demonstrated high-responsivity flexible solar-blind photodetectors. The EG was favorably influenced by lattice arrangement of SiC, and thus enabled beta-Ga2O3 direct-epitaxy on the EG. The beta-Ga2O3 layer was spontaneously exfoliated at the interface of GR owing to its low interfacial toughness by controlling the energy release rate through electroplated Ni layers. The use of GR templates contributes to the seamless exfoliation of the nanomembranes, and the technique is relevant to eventual nanomembrane-based integrated device technology.