• 文献标题:   Bilayer Graphene: From Stacking Order to Growth Mechanisms
  • 文献类型:   Review
  • 作  者:   GUAN R, YUAN AH, LUO BR
  • 作者关键词:   bandgap, bilayer graphene, chemical vapor deposition, growth mechanism, stacking order
  • 出版物名称:   PHYSICA STATUS SOLIDIRAPID RESEARCH LETTERS
  • ISSN:   1862-6254 EI 1862-6270
  • 通讯作者地址:   Tianjin Normal Univ
  • 被引频次:   1
  • DOI:   10.1002/pssr.201900605 EA JAN 2020
  • 出版年:   2020

▎ 摘  要

Due to the unique bandgap tunability of bilayer graphene, the preparation of large-sized bilayer graphene has attracted a wide range of attention. Herein, the preparation of bilayer graphene, from stacking order to growth mechanism, is reviewed, and the chemical vapor deposition (CVD) of AB-stacked bilayer graphene on copper substrate is emphasized. Various methods and growth strategies to synthesize bilayer graphene and the corresponding growth mechanisms are discussed. Mechanisms of layer-by-layer growth, the hydrogen passivation of graphene edges for the formation of bilayers, and carbon atoms penetrating through a copper wall for bilayer growth are included and highlighted for a better understanding of controlling bilayer graphene uniformity and forming its stacking order. Finally, the remaining challenges and the potential development of CVD-controlled growth of bilayer graphene are outlined.