• 文献标题:   Perfect Extinction of Terahertz Waves in Monolayer Graphene over 2-nm-Wide Metallic Apertures
  • 文献类型:   Article
  • 作  者:   PARK HR, NAMGUNG S, CHEN XS, LINDQUIST NC, GIANNINI V, FRANCESCATO Y, MAIER SA, OH SH
  • 作者关键词:   atomiclayer lithography, graphene, nanogap, plasmonic, terahertz nanophotonic
  • 出版物名称:   ADVANCED OPTICAL MATERIALS
  • ISSN:   2195-1071
  • 通讯作者地址:   Univ Minnesota
  • 被引频次:   11
  • DOI:   10.1002/adom.201400546
  • 出版年:   2015

▎ 摘  要

High carrier mobility and tunability in graphene enable fundamental studies for plasmonics and various applications. Despite its versatility, however, single-layer graphene (SLG) suffers from poor coupling efficiency to electromagnetic waves, presenting a major challenge for photonic applications. Compared with visible or infrared radiation, terahertz (THz) waves exhibit higher absorption in SLG due to Drude-like intraband transitions, but the wavelength-to-SLG size mismatch becomes even more dramatic. Here, we experimentally demonstrate 99% extinction of THz wave transmission when SLG covers the openings of 2-nm-wide (approximate to lambda/1 000 000) slits through a metal film. By resonantly coupling THz waves through annular nanogaps, the extremely localized fields lead to near-perfect extinction and strong absorption in SLG. Atomic-layer lithography is used to produce these nanometer-wide, millimeter-long gaps over an entire 4-in. wafer. Furthermore, by integrating these devices with an ionic liquid, enhanced intraband absorption in the SLG leads to 80% modulation of THz waves with an operational voltage as low as 1.5 V.