• 文献标题:   Free-Standing Epitaxial Graphene
  • 文献类型:   Article
  • 作  者:   SHIVARAMAN S, BARTON RA, YU X, ALDEN J, HERMAN L, CHANDRASHEKHAR MVS, PARK J, MCEUEN PL, PARPIA JM, CRAIGHEAD HG, SPENCER MG
  • 作者关键词:  
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Cornell Univ
  • 被引频次:   135
  • DOI:   10.1021/nl900479g
  • 出版年:   2009

▎ 摘  要

We report on a method to produce free-standing graphene sheets from epitaxial graphene on silicon carbide (SiC) substrate. Doubly clamped nanomechanical resonators with lengths up to mu 0 pm were patterned using this technique and their resonant motion was actuated and detected optically. Resonance frequencies of the order of tens of megahertz were measured for most devices, indicating that the resonators are much stiffer than expected for beams under no tension. Raman spectroscopy suggests that the graphene is not chemically modified during the release of the devices, demonstrating that the technique is a robust means of fabricating large-area suspended graphene structures.