• 文献标题:   High-Fidelity Conformation of Graphene to SiO2 Topographic Features
  • 文献类型:   Article
  • 作  者:   CULLEN WG, YAMAMOTO M, BURSON KM, CHEN JH, JANG C, LI L, FUHRER MS, WILLIAMS ED
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW LETTERS
  • ISSN:   0031-9007
  • 通讯作者地址:   Univ Maryland
  • 被引频次:   99
  • DOI:   10.1103/PhysRevLett.105.215504
  • 出版年:   2010

▎ 摘  要

High-resolution noncontact atomic force microscopy of SiO2 reveals previously unresolved roughness at the few-nm length scale, and scanning tunneling microscopy of graphene on SiO2 shows graphene to be slightly smoother than the supporting SiO2 substrate. A quantitative energetic analysis explains the observed roughness of graphene on SiO2 as extrinsic, and a natural result of highly conformal adhesion. Graphene conforms to the substrate down to the smallest features with nearly 99% fidelity, indicating conformal adhesion can be highly effective for strain engineering of graphene.