• 文献标题:   Exploring the working mechanism of graphene patterning by magnetic-assisted UV ozonation
  • 文献类型:   Article
  • 作  者:   YUE H, TAO HH, WU YX, SU SB, LI H, NI ZH, CHEN XF
  • 作者关键词:  
  • 出版物名称:   PHYSICAL CHEMISTRY CHEMICAL PHYSICS
  • ISSN:   1463-9076 EI 1463-9084
  • 通讯作者地址:   Shanghai Jiao Tong Univ
  • 被引频次:   0
  • DOI:   10.1039/c7cp03523c
  • 出版年:   2017

▎ 摘  要

When assisted with an inhomogenous vertical magnetic field, ultraviolet (UV) ozonation turns directional and is testified to be applicable to graphene patterning. Using a more cost-effective low-pressure mercury lamp, we further explore the underlying working mechanism by changing oxygen content, introducing reactive ozone or inert nitrogen molecules, and study the lateral under-oxidation impeded Dirac point shifts for a graphene field-effect transistor under UV irradiation. The paramagnetic oxygen molecule X-3 Sigma(-)(g) accelerates toward graphene with the magnetic moment aligned parallel to the magnetic field. The O(P-3) atoms, stemming from such a directional oxygen molecule, have a high initial velocity before being further accelerated, and therefore enhance the oxidation capability compared with those from weak diamagnetic ozone molecules. Intermolecular or atomic-molecular collisions between the high-speed oxygen molecules/atoms and the randomly moved weak diamagnetic molecules,including nitrogen and ozone, appear crucial in deteriorating graphene patterning by increasing the lateral under-oxidation. This study may shed light on our understanding of graphene patterning by magnetic-assisted UV ozonation.