• 文献标题:   High throughput scanning mu LEED imaging of surface structural heterogeneity: Defective graphene on Cu(111)
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   LAU KLW, YU KM, LUO D, RUOFF RS, ALTMAN MS
  • 作者关键词:   scanning microlow energy electron diffraction, thin film microstructure, graphene
  • 出版物名称:   ULTRAMICROSCOPY
  • ISSN:   0304-3991 EI 1879-2723
  • 通讯作者地址:   Hong Kong Univ Sci Technol
  • 被引频次:   0
  • DOI:   10.1016/j.ultramic.2019.02.015
  • 出版年:   2019

▎ 摘  要

Micro-low energy electron diffraction (mu LEED) is frequently used in conjunction with low energy electron microscopy (LEEM) to learn about local surface structural features in small selected areas. Scanning mu LEED measurements performed with a very small electron beam (250 nm) can provide precise quantitative information about structural variations with high spatial resolution. We have developed the Source Extraction and Photometry (SEP) - Spot Profile Analysis (SPA) tool for evaluating scanning mu LEED data with high throughput. The capability to automate diffraction peak identification with SEP-SPA opens up the possibility to investigate systems with complex diffraction patterns in which diffraction peak positions vary rapidly for small lateral displacements on the surface. The application of this tool to evaluate scanning mu LEED data obtained for defective graphene on Cu(111) demonstrates its capabilities. A rich rotational domain structure is observed in which a majority of the graphene is co-aligned with the Cu(111) substrate and the significant remainder comprises domains with large rotations and small sizes that are comparable to the small beam size.