▎ 摘　　要

Direct growth of spherical graphene with large surface area is important for various applications in sensor technology. However, the preparation of transfer-free graphene on different substrates is still a challenge. This study presents a novel approach for the transfer-free graphene growth directly on cemented carbide. The used simple thermal annealing induces an in-situ transformation of magnetron-sputtered amorphous silicon carbide films into the graphene matrix. The study reveals the role of Co, a binding phase in cemented carbides, in Si sublimation process, and its interplay with the annealing temperature in development of the graphene matrix. A detailed physico-chemical characterisation was performed by structural (XRD analysis and Raman spectroscopy with mapping studies), morphological (SEM) and chemical (EDS) analyses. The optimal bilayer graphene matrix with hollow graphene spheres on top readily grows at 1000 degrees C. Higher annealing temperature critically decreases the amount of Si, which yields an increased number of the graphene layers and formation of multi-layer graphene (MLG). The proposed action mechanism involves silicidation of Co during thermal treatment, which influences the existing chemical form of Co, and thus, the graphene formation and variations in a number of the formed graphene layers.