• 文献标题:   Reduction pathway of graphene oxide affects conjugation-mediated horizontal gene transfer under environmental conditions
  • 文献类型:   Article
  • 作  者:   ZHANG QR, LIU XL, ZHOU HX, LU YL, FAN YY, WU LJ, XIAO X
  • 作者关键词:   antimicrobial resistance, antibiotic resistance gene, horizontal gene transfer, graphene oxide, environmental transformation
  • 出版物名称:   CHEMICAL ENGINEERING JOURNAL
  • ISSN:   1385-8947 EI 1873-3212
  • 通讯作者地址:  
  • 被引频次:   1
  • DOI:   10.1016/j.cej.2022.138301 EA JUL 2022
  • 出版年:   2022

▎ 摘  要

Antimicrobial resistance in the environment has become a critical issue and its dissemination mediated by nanomaterials is receiving increasing attention. However, current studies overlook the contribution of the environmental transformation of nanomaterials to the horizontal transfer of antibiotic resistance genes (ARGs). Herein, graphene oxide (GO) was transformed by simulated illumination or ferrous iron (Fe2+) to mimic the naturally occurring GO reduction, and for the first time, the distinct effects of reduced GO (rGO) on ARGs horizontal transfer were observed. Compared with pristine GO, the transfer of plasmid-borne ARGs was dramatically enhanced by light-reduced GO. The remarkable production of stabilized graphene radical excited by ultraviolet irradiation triggered bacterial oxidative stress and contributed to membrane permeability. However, when reduced by Fe2+, the facilitation of ARGs transfer mediated by GO was attenuated, which was attributed to the physical wrapping of large rGO aggregates that hindered plasmid transfer between bacteria. Furthermore, the generated transconjugant strain via GO-mediated conjunction showed stronger macrophage infection than the original Escherichia coli under antibiotic treatment. These findings emphasize that nanomaterial-mediated ARGs transfer depends on its transformation pathways in a realistic environment, which is helpful for the under-standing of the dissemination of antimicrobial resistance.