• 文献标题:   Transport behavior and negative magnetoresistance in chemically reduced graphene oxide nanofilms
  • 文献类型:   Article
  • 作  者:   WANG SW, LIN HE, LIN HD, CHEN KY, TU KH, CHEN CW, CHEN JY, LIU CH, LIANG CT, CHEN YF
  • 作者关键词:  
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Natl Taiwan Univ
  • 被引频次:   20
  • DOI:   10.1088/0957-4484/22/33/335701
  • 出版年:   2011

▎ 摘  要

The electron transport behavior in chemically reduced graphene oxide (rGO) sheets with different thicknesses of 2, 3, and 5 nm was investigated. The four-probe method for the sheet resistance (R-S) measurement on the intensively reduced graphene oxide samples indicates an Arrhenius characteristic of the electron transport at zero magnetic field B = 0, consistent with previous experimental results on well-reduced GO samples. The anticipated variable range hopping (VRH) transport of electrons in a two-dimensional electron system at low temperatures was not observed. The measured R-S of the rGO samples are below 52 k Omega/square at room temperature. With the application of a magnetic field up to 4 T, negative magnetoresistance in the Mott VRH regime was observed. The magnetotransport features support a model based on the spin-coupling effect from the vacancy-induced midgap states that facilitate the Mott VRH conduction in the presence of an external magnetic field.