• 文献标题:   Graphene resist interlacing process for versatile fabrication of free-standing graphene
  • 文献类型:   Article
  • 作  者:   KUMAR S, REZVANI E, NICOLOSI V, DUESBERG GS
  • 作者关键词:  
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484
  • 通讯作者地址:   CRANN
  • 被引频次:   5
  • DOI:   10.1088/0957-4484/23/14/145302
  • 出版年:   2012

▎ 摘  要

We present a graphene resist interlacing process (GRIP) to sandwich graphene between polymer lines in a cloth-like fashion, making it more accessible for experiments and applications. We demonstrate the handling of large-area graphene in this way. Here, GRIP is used to fabricate supports for transmission electron microscopy. These supports improve the imaging quality of nanoparticles, as we show by comparison to imaging on standard lacey carbon supports.