• 文献标题:   Reconfigurable edge-state engineering in graphene using LaAlO3/SrTiO3 nanostructures
  • 文献类型:   Article
  • 作  者:   LI JA, GUO Q, CHEN L, HAO S, HU Y, HSU JF, LEE H, LEE JW, EOM CB, D URSO B, IRVIN P, LEVY J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Pittsburgh
  • 被引频次:   0
  • DOI:   10.1063/1.5080251
  • 出版年:   2019

▎ 摘  要

The properties of graphene depend sensitively on doping with respect to the charge-neutrality point (CNP). Tuning the CNP usually requires electrical gating or chemical doping. Here, we describe a technique to reversibly control the CNP in graphene with nanoscale precision, utilizing LaAlO3/SrTiO3 (LAO/STO) heterostructures and conductive atomic force microscope (c-AFM) lithography. The local electron density and resulting conductivity of the LAO/STO interface can be patterned with a conductive AFM tip [Cen et al., Nat. Mater. 7, 298 (2008)] and placed within two nanometers of an active graphene device [Huang et al., APL Mater. 3, 062502 (2015)]. The proximal LAO/STO nanostructures shift the position of graphene CNP by similar to 10(12) cm(-2) and are also gateable. Here, we use this effect to create reconfigurable edge states in graphene, which are probed using the quantum Hall effect. Quantized resistance plateaus at h/e(2) and h/3e(2) are observed in a split Hall device, demonstrating edge transport along the c-AFM written edge that depends on the polarity of both the magnetic field and direction of currents. This technique can be readily extended to other device geometries. (C) 2019 Author(s).