• 文献标题:   Defect Control and n-Doping of Encapsulated Graphene by Helium-Ion-Beam Irradiation
  • 文献类型:   Article
  • 作  者:   NANDA G, GOSWAMI S, WATANABE K, TANIGUCHI T, ALKEMADE PFA
  • 作者关键词:   helium ion microscopy, graphene, hexagonal boron nitride hbn, ioninduced damage, selfhealing, ndoping
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Delft Univ Technol
  • 被引频次:   31
  • DOI:   10.1021/acs.nanolett.5b00939
  • 出版年:   2015

▎ 摘  要

We study with Raman spectroscopy the influences of He+ bombardment and the environment on beam-induced defects, in graphene encapsulated in hexagonal boron nitride (h-BN). We show, for the first time experimentally the autonomous behavior of the D', defect Raman peak: in Contrast to the D defect peak, the D' defect peak is sensitive to the local environment. In particular, it saturates with ion dose in the encapsulated graphene. Electrical measurements reveal n-type: conduction in the BN-encapsulated graphene. We conclude that unbound atoms ("interfacials between the sp(2)-layers of graphene and h-BN promote self healing of the beam-induced lattice damage and that nitrogen-carbon exchange leads to n-doping of graphene: