• 文献标题:   Dislocation entangled mechanisms in cu-graphene nanocomposite fabricated by high-pressure sintering
  • 文献类型:   Article
  • 作  者:   KHOBRAGADE N, MAITY T, SWIDERSKASRODA A, STANISLAW G, LOJKOWSKI W, BABU PN, PAL S, ROY D
  • 作者关键词:   cugraphene nanocomposite, highpressure sintering, electrical conductivity, nanoindentation, molecular dynamics simulation
  • 出版物名称:   MATERIALS CHARACTERIZATION
  • ISSN:   1044-5803 EI 1873-4189
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:   10.1016/j.matchar.2022.112524 EA DEC 2022
  • 出版年:   2023

▎ 摘  要

Graphene reinforced Cu-based nanocomposite (Cu-Gr), synthesized using high-pressure forming (-8 GPa) route at 300 degrees C, achieved 96% of relative density and 84% IACS improvement in electrical conductivity, along with a significant increase in hardness and Young's modulus up to-94 GPa. The structure and defects evolution of NC -Cu and Cu-Gr nanocomposites were investigated using nanoindentation approach, and then backed up compu-tationally. Molecular dynamics (MD) simulations results are well agreed with experimental data, which signif-icantly reveled that grain growth and grain boundary sliding (GBS) are dominant deformation mechanism involves grain boundary movement through dislocation motion, stacking faults (SFs) and twin boundary (TBs) formation, along with matrix failure through grain growth and GBS with an increase in loading, and subse-quently bending (bow shape) processes.