• 文献标题:   Micro cell array on silicon substrate using graphene sheet
  • 文献类型:   Article
  • 作  者:   SON HG, OH HG, PARK YS, KIM DH, LEE DS, PARK WH, KIM HJ, CHO SM, LIM KM, SONG KS
  • 作者关键词:   cell array, fluorination, graphene, passivation layer, plasma treatment
  • 出版物名称:   MATERIALS LETTERS
  • ISSN:   0167-577X EI 1873-4979
  • 通讯作者地址:   Kumoh Natl Inst Technol
  • 被引频次:   5
  • DOI:   10.1016/j.matlet.2017.03.071
  • 出版年:   2017

▎ 摘  要

To fabricate micro-patterns for bioengineering applications, we used graphene sheet, metal mask, and plasma treatment rather than the commonly used photolithography process. Two types of micropatterns were fabricated (line, and circle) on SiO2/Si (100, p-typed) substrate. In the line and circle micro-patterns, graphene etched areas were 100 and 150 lm, respectively, with fluorinated graphene spacing. The efficiencies of early cell adhesion, which is necessary for the growth and proliferation of cells, were 62, 17, and 65% on the pristine, fluorinated, and etched graphene surface, respectively, for 6 h of cell culture. After seeding the neuron cells on the patterned substrate, neuron cells proliferated and differentiated along the graphene etched regions. The graphene sheet was used as a passivation layer for micro-array of the neuron cell on SiO2/Si. (C) 2017 Elsevier B. V. All rights reserved.