• 文献标题:   Effect of oxide traps on channel transport characteristics in graphene field effect transistors
  • 文献类型:   Article
  • 作  者:   BONMANN M, VOROBIEV A, STAKE J, ENGSTROM O
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF VACUUM SCIENCE TECHNOLOGY B
  • ISSN:   2166-2746
  • 通讯作者地址:   Chalmers Univ Technol
  • 被引频次:   10
  • DOI:   10.1116/1.4973904
  • 出版年:   2017

▎ 摘  要

A semiempirical model describing the influence of interface states on characteristics of gate capacitance and drain resistance versus gate voltage of top gated graphene field effect transistors is presented. By fitting our model to measurements of capacitance-voltage characteristics and relating the applied gate voltage to the Fermi level position, the interface state density is found. Knowing the interface state density allows us to fit our model to measured drain resistance-gate voltage characteristics. The extracted values of mobility and residual charge carrier concentration are compared with corresponding results from a commonly accepted model which neglects the effect of interface states. The authors show that mobility and residual charge carrier concentration differ significantly, if interface states are neglected. Furthermore, our approach allows us to investigate in detail how uncertainties in material parameters like the Fermi velocity and contact resistance influence the extracted values of interface state density, mobility, and residual charge carrier concentration. (C) 2017 Author(s).