• 文献标题:   High temperature measurements of metal contacts on epitaxial graphene
  • 文献类型:   Article
  • 作  者:   NAGAREDDY VK, NIKITINA IP, GASKILL DK, TEDESCO JL, MYERSWARD RL, EDDY CR, GOSS JP, WRIGHT NG, HORSFALL AB
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Newcastle Univ
  • 被引频次:   29
  • DOI:   10.1063/1.3627167
  • 出版年:   2011

▎ 摘  要

Electrical characteristics of Cr/Au and Ti/Au metal contacts on epitaxial graphene on 4H-SiC showed significant variations in resistance parameters at 300 K. These parameters decreased substantially as the temperature increased to 673 K. The work function, binding energy, and diffusion energy of the deposited metals were used to explain these observed variations. The quantitative analysis of our data demonstrates that non-reactive metals with higher work functions result in lower contact resistance, which can be further decreased by 70% using appropriate annealing. These results provide important information when considering epitaxial graphene for high temperature applications. (C) 2011 American Institute of Physics. [doi:10.1063/1.3627167]