• 专利标题:   Preparing a superconducting graphene coating involves placing workpiece in an ultrasonic cleaning device, followed by ultrasonic degreasing cleaning, pure water ultrasonic cleaning, pure water rinsing, and water removal.
  • 专利号:   CN109023231-A
  • 发明人:   HAN Z, GAO H, WEI K
  • 专利权人:   CHANGZHOU EMATERIAL TECHNIC CO LTD
  • 国际专利分类:   C23C014/02, C23C014/06, C23C014/32
  • 专利详细信息:   CN109023231-A 18 Dec 2018 C23C-014/02 201917 Pages: 9 Chinese
  • 申请详细信息:   CN109023231-A CN11051863 10 Sep 2018
  • 优先权号:   CN11051863

▎ 摘  要

NOVELTY - Preparing a superconducting graphene coating involves placing workpiece in an ultrasonic cleaning device, followed by ultrasonic degreasing cleaning, pure water ultrasonic cleaning, pure water rinsing, water removal, hydrocarbon solvent vacuum ultrasonic cleaning, vacuum heating drying. The cleaning vacuum degree of the hydrocarbon solvent vacuum ultrasonic cleaning process is 200Pa~500Pa, and the vacuum degree during the vacuum heating drying process is 100Pa~200Pa and the heating temperature is 90 degrees C. After the cleaning is completed, the workpiece is placed in a constant temperature container equipped with a depassivation film solution, and the temperature is maintained at 80 degrees C for 30 minutes. The workpiece is placed in clean water for rinsing, then water is removed, and then loaded onto a specific fixture to wait for coating. USE - Method for preparing a superconducting graphene coating. ADVANTAGE - The method enables to prepare a superconducting graphene coating, which has low cost, simple preparation method and excellent electrical and corrosion resistance. DETAILED DESCRIPTION - The fixture with the workpiece is placed in the vacuum chamber, the sealed door on both sides of the vacuum chamber is closed, and then the vacuum pump set is turned on, and the vacuum system is pumped from the atmospheric state to 5x 10-3Pa. The heating device is started to heat the temperature in the vacuum furnace to 200-350 degrees C, then filled with argon gas, the partial pressure of argon gas is 0.4-1.0Pa, turning on the hot wire heating power supply. The hot wire current is gradually increased from 10A to 30A~60A, then the hot wire bias power supply is turned on, the voltage is set to -30V~-60V, and then the workpiece bias of the coating machine is turned on. The bias voltage is set to -200V~-800V, the duty ratio is set to 60%~80%, and the substrate surface ion sputtering and etching activation are performed for 10min~120min. The workpiece bias, the hot wire bias, and the hot wire heating power supply are turned off in turn, the argon partial pressure is reduced to 0.2 Pa to 0.8 Pa, and then the workpiece bias power is turned on. The bias voltage is set to -600V~-1000V, the duty ratio is set to 10~80%, then the titanium target is turned on, and the arc current of the titanium alloy target is set to 50A~120A, and the metal ion bombardment process is performed. After the pre-coating treatment, the argon gas is continuously and stably input, and the argon partial pressure is maintained at 0.2 Pa to 0.8 Pa, and the workpiece bias power source is kept turned on. The bias voltage is set to -30V~-800V, the duty ratio is 10%~80%, keeping the titanium target in the open state, and setting the arc current of the titanium alloy target to 50A~120A for 1min~30min to complete the transition layer. After the transition layer is deposited, the workpiece bias power supply is turned on, the bias voltage is set to -30V~-800V, the duty ratio is 10%~80%, and the nitrogen gas is turned on. The argon gas is kept continuously flowing, the ratio of nitrogen flow rate to argon flow rate is 1:35~1:2, so that the total pressure in the vacuum chamber is maintained at 0.2Pa~0.8Pa for 10min~60min. After the conductive corrosion resistant layer is deposited, the nitrogen gas is turned off, the bias voltage is turned on, and the bias voltage is set to -30V~-800V, and the titanium alloy target is kept open. The graphite target is turned on, the target arc current is set to 50A~120A, and the arc current ratio of the titanium target to the graphite target is 1:1~1:2 for 1min~20min. After the secondary conductive transition layer is deposited, the titanium target is closed, and the bias is turned on. The bias voltage is set to -30V~-800V, and the graphite target is kept open, and the target arc current is set to 50A~100A for 1~10min. After completion, the graphite target arc power supply, the bias power supply, the argon gas flow meter, and the furnace body heating power source are sequentially turned off, and the vacuum maintenance system is kept open to perform furnace cooling. After the temperature in the furnace is cooled to 100 degrees C, the vacuum maintenance system is turned off, and the air inlet valve is opened to put the air in the furnace so that the pressure in the furnace is consistent with the atmospheric pressure. The vacuum chamber door is opened, and the samples are taken out in sequence.