• 专利标题:   Graphene field effect transistor, has insulating layer formed on semiconductor substrate, and gate electrode located on gate dielectric layer, which is provided with graphene oxide medium layer and metal oxide dielectric layer.
  • 专利号:   CN103325836-A, CN103325836-B
  • 发明人:   JIN Z, ZHANG D, CHEN J, MA P, PENG S, SHI J
  • 专利权人:   INST MICROELECTRONICS CHINESE ACAD SCI
  • 国际专利分类:   H01L021/285, H01L021/336, H01L029/51, H01L029/78
  • 专利详细信息:   CN103325836-A 25 Sep 2013 H01L-029/78 201379 Pages: 8 Chinese
  • 申请详细信息:   CN103325836-A CN10228701 08 Jun 2013
  • 优先权号:   CN10228701

▎ 摘  要

NOVELTY - The transistor has an insulating layer (11), a conductive channel (12) and a source electrode (13), where the insulating layer is formed on a semiconductor substrate (10) and the conductive channel. The source electrode and a drain electrode (14) are arranged on the conductive channel. A gate dielectric layer (15) is formed on the source electrode, and the conductive channel is made of graphite material. A gate electrode (17) is located on the gate dielectric layer, which is provided with a graphene oxide medium layer and a metal oxide dielectric layer (16). USE - Graphene field effect transistor. ADVANTAGE - The transistor has better performance, and solves the problem of atomic layer deposition process. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for preparing a graphene field effect transistor. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a graphene field effect transistor. Semiconductor substrate (10) Insulating layer (11) Conductive channel (12) Source electrode (13) Drain electrode (14) Gate dielectric layer (15) Metal oxide dielectric layer (16) Gate electrode (17)