▎ 摘 要
NOVELTY - Manufacture of photoresist-graphene composite material involves exposing a mixture comprising a graphene material and a photoresist using a mask pattern, and treating the exposed material with a developing solution to remove uncrosslinked portions to obtain a composite photoresist-graphene material. The graphene material is graphene and/or graphene oxide. USE - Manufacture of photoresist-graphene composite material for catalyst support, surface adsorbent material and micro-sensor (all claimed). ADVANTAGE - The photoresist-graphene composite material having high specific surface area is prepared by simple method.