• 专利标题:   Preparation method of a large domain graphene single crystal, involves annealing sapphire/metal substrate with oxygen-containing gas and providing growth gas according to mode of increasing proportion gradient of growth gas, and growing on sapphire/metal substrate to obtain graphene single crystal.
  • 专利号:   CN114836828-A
  • 发明人:   LIU Z, PENG H, CAO Y, WANG Y, DU Y, TANG J, YAN R
  • 专利权人:   UNIV PEKING, BEIJING GRAPHENE INST
  • 国际专利分类:   C30B025/18, C30B029/02
  • 专利详细信息:   CN114836828-A 02 Aug 2022 C30B-029/02 202297 Chinese
  • 申请详细信息:   CN114836828-A CN10138724 01 Feb 2021
  • 优先权号:   CN10138724

▎ 摘  要

NOVELTY - Preparation method of large domain graphene single crystal,involves(1) annealing the sapphire/metal substrate with an oxygen-containing gas; (2) providing growth gas according to a mode of increasing the proportion gradient of the growth gas, and growing on the sapphire/metal substrate to obtain graphene single crystal in the large domain area. USE - Preparation method of large domain graphene single crystal. ADVANTAGE - The quality of graphene film is greatly improved, obtained graphene is in monocrystalline form, size of a monocrystalline domain of the obtained graphene is large, and size of the domain is several times that of the graphene monocrystalline obtained by a conventional method.