• 专利标题:   CVD graphene process based flexible device and substrate manufacturing method, involves forming flexible substrate, and coating graphene-containing layer on surface of graphite dilute purification layer.
  • 专利号:   CN103280541-A, CN103280541-B
  • 发明人:   XU C, ZHU Y, GUO W, HAN J, SUN J
  • 专利权人:   UNIV BEIJING TECHNOLOGY
  • 国际专利分类:   H01L051/52, H01L051/56
  • 专利详细信息:   CN103280541-A 04 Sep 2013 H01L-051/56 201377 Pages: 6 Chinese
  • 申请详细信息:   CN103280541-A CN10193868 23 May 2013
  • 优先权号:   CN10193868

▎ 摘  要

NOVELTY - The method involves forming a graphene-containing layer (2) on a flexible electronic device functional structure (5). A flexible substrate (6) is formed. A hydrogen bubble metal catalyst substrate (1) is adhered on the graphene-containing layer in an electrolytic cell by an electrochemical process. A cathode product is obtained by generating hydrogen gas from the hydrogen bubble metal catalyst substrate. A direct current electrolysis process is carried out. The graphene-containing layer is coated on a surface of the graphite dilute purification layer. USE - Method for manufacturing flexible device and substrate based on CVD graphene process. ADVANTAGE - The method enables reducing production cost and processing time and avoiding pollution. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view illustrating a CVD graphene process based flexible device and flexible substrate manufacturing method. Hydrogen bubble metal catalyst substrate (1) Forming graphene-containing layer (2) Flexible electronic device functional structure (5) Flexible substrate (6)