• 专利标题:   Manufacturing graphene co-extruded film, comprises forming hexagonal boron nitride layer in upper side of substrate, forming metal catalytic layer, forming top graphene layer, and removing metal catalytic layer and top graphene layer.
  • 专利号:   KR2013032536-A, KR1294362-B1
  • 发明人:   KIM H K, YANG W S, GEUN K H, SEOK Y U
  • 专利权人:   KOREA ELECTRONICS TECHNOLOGY INST
  • 国际专利分类:   C01B021/064, C01B031/02, C23C016/26, C23C016/34
  • 专利详细信息:   KR2013032536-A 02 Apr 2013 C01B-031/02 201378 Pages: 10
  • 申请详细信息:   KR2013032536-A KR096187 23 Sep 2011
  • 优先权号:   KR096187

▎ 摘  要

NOVELTY - The method comprises forming a hexagonal boron nitride layer (130) in an upper side of a noncatalytic substrate (110), forming a metal catalytic layer (150) at an upper part of the hexagonal boron nitride layer, forming a top graphene layer (190) at an upper part of the metal catalytic layer, and removing the metal catalytic layer and the top graphene layer, where carbon is supplied to the metal catalytic layer. The noncatalytic substrate comprises silicon substrate, silicon/silicon dioxide substrate, sapphire substrate, quartz substrate and glass substrate. USE - The method is useful for manufacturing a graphene co-extruded film (claimed). ADVANTAGE - The method is capable of preventing surface roughness problem in the hexagonal boron nitride layer formation. DETAILED DESCRIPTION - The method comprises forming a hexagonal boron nitride layer (130) in an upper side of a noncatalytic substrate (110), forming a metal catalytic layer (150) at an upper part of the hexagonal boron nitride layer, forming a top graphene layer (190) at an upper part of the metal catalytic layer, and removing the metal catalytic layer and the top graphene layer, where carbon is supplied to the metal catalytic layer. The noncatalytic substrate comprises silicon substrate, silicon/silicon dioxide substrate, sapphire substrate, quartz substrate and glass substrate. The metal catalytic layer has a thickness of 10-100 nm. The step of forming the metal catalytic layer comprises patterning the metal catalytic layer and depositing the metal catalytic layer at the upper part of the hexagonal boron nitride layer. The step of patterning the metal catalytic layer comprises patterning a channel region for connecting a source region in a central part of the metal catalytic layer and a drain region. An INDEPENDENT CLAIM is included for a graphene co-extruded film. DESCRIPTION OF DRAWING(S) - The diagram shows a schematic perspective view of a metal catalytic layer before removing a top graphene layer in a graphene co-extruded film manufactured by a graphene co-extruded film manufacturing method. Graphene co-extruded film (100) Noncatalytic substrate (110) Hexagonal boron nitride layer (130) Metal catalytic layer (150) Top graphene layer. (190)