• 专利标题:   Graphene laminated substrate for thermal radiation equipment, comprises graphene with equalized anisotropy, and amorphous carbon film or boron nitride film provided on each opposite surface perpendicular to lamination direction.
  • 专利号:   JP2020053614-A
  • 发明人:   TATSUTA M, FUJIWARA K
  • 专利权人:   MITSUBISHI MATERIALS CORP
  • 国际专利分类:   B32B009/00, C23C014/06, C23C014/18, C23C016/27, H01L023/373
  • 专利详细信息:   JP2020053614-A 02 Apr 2020 H01L-023/373 202030 Pages: 6 Japanese
  • 申请详细信息:   JP2020053614-A JP183306 28 Sep 2018
  • 优先权号:   JP183306

▎ 摘  要

NOVELTY - A graphene laminated substrate comprises graphene with equalized anisotropy laminated in the thickness direction as the lamination direction, and an amorphous carbon film or a boron nitride film as coating layer provided on each opposite surface perpendicular to the lamination direction. USE - Graphene laminated substrate used in thermal radiation equipment used in power semiconductors e.g. metal oxide semiconductor FETs mounted in electric vehicles. ADVANTAGE - The graphene laminated substrate has excellent strength and crack resistance, and high thermal conductivity, and is lightweight. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of the composite substrate.