• 专利标题:   Preparation of ultraclean graphene comprises considering gas path from upstream to downstream direction, placing copper acetate and copper substrates at intervals and introducing hydrogen for chemical vapor deposition.
  • 专利号:   CN107500276-A
  • 发明人:   LIU Z, PENG H, GU K, ZHANG J, LIN L, SUN L
  • 专利权人:   UNIV PEKING
  • 国际专利分类:   C01B032/186
  • 专利详细信息:   CN107500276-A 22 Dec 2017 C01B-032/186 201806 Pages: 10 Chinese
  • 申请详细信息:   CN107500276-A CN10845504 19 Sep 2017
  • 优先权号:   CN10845504

▎ 摘  要

NOVELTY - Preparation of ultraclean graphene comprises considering gas path from upstream to downstream direction, placing copper acetate and copper substrates at intervals and introducing hydrogen for chemical vapor deposition where temperature of copper acetate in the temperature zone is volatilization temperature of copper acetate. USE - Method for preparing ultraclean graphene (claimed). ADVANTAGE - The method is simple and has easy to get raw materials. The product is suitable for optical and electrical field and has high quality.