• 专利标题:   Plasma-based thin-film graphene device has high pressure negative power supply that is connected with cathode electrode through upper end sealing rubber plug, and vacuum pump which is connected with vacuum meter through vacuum valve.
  • 专利号:   CN204454596-U
  • 发明人:   BAO Z, CEN K, CHI Y, LI X, YAN J, QIAN J
  • 专利权人:   UNIV ZHEJIANG
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN204454596-U 08 Jul 2015 C01B-031/04 201567 Pages: 10 Chinese
  • 申请详细信息:   CN204454596-U CN20078252 04 Feb 2015
  • 优先权号:   CN20078252

▎ 摘  要

NOVELTY - The new type utility claims have one kind based on plasma prepared graphene thin film and device, wherein, quartz tube middle horizontal sample supporting frame, provided with quartz tube upper part provided with the cathode electrode, quartz tube lower part provided with the anode electrode, quartz tube between upper, lower end set with sealing rubber plug, cathode electrode and sample supporting frame provided with a negative glow area, the anode electrode and between sample supporting frame set with Faraday dark area, gas regulating valve through mass flow meter, upper end sealing rubber plug and quartz pipe on connection part, high pressure negative power supply by upper end sealing rubber plug and cathode electrode connected, vacuum pump through vacuum valve, vacuum meter, lower end sealing rubber plug and quartz tube lower part connection, the anode electrode by lower end sealing rubber plug ground. The utility model is new type preparation to obtain the graphene thin film high degree of graphitization, performance is excellent. In addition, the utility model is new type is compared with traditional chemistry reducing method and heat reducing method, with short time consumption, high reduction efficiency, no need reducing agent and heating source, equal potential with the large scale industrial application.