• 专利标题:   Manufacture of highly dispersible reduced graphene oxide based metal nanoparticle dispersion, involves preparing mixture comprising graphene oxide, metal nanoparticle precursor, and saccharides, and plasma processing mixture.
  • 专利号:   KR2016053303-A, KR1630533-B1
  • 发明人:   CHOI H S, KIM S H
  • 专利权人:   UNIV IND ACADEMIC COOP IN CHUNGNAM NAT
  • 国际专利分类:   B22F009/24, B82B003/00, C01B031/04
  • 专利详细信息:   KR2016053303-A 13 May 2016 201642 Pages: 12 English
  • 申请详细信息:   KR2016053303-A KR151124 03 Nov 2014
  • 优先权号:   KR151124

▎ 摘  要

NOVELTY - The manufacture of reduced graphene oxide based metal nanoparticle dispersion involves preparing mixture comprising graphene oxide, metal nanoparticle precursor, and saccharides, and plasma processing the mixture. USE - Manufacture of highly dispersible reduced graphene oxide based metal nanoparticle dispersion, used in manufacture of reduced graphene oxide based metal nano particle film. ADVANTAGE - The metal nanoparticle dispersion has high dispersibility, and does not use the toxic material or the plasma discharge gas as the reducing agent, and is manufactured with single process rapidly. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of reduced graphene oxide based metal nanoparticle film, which involves coating the reduced graphene oxide based metal nanoparticle dispersed solution on the material.