▎ 摘　　要

NOVELTY - Pellicle film comprises a boron nitride nanostructure layer. USE - The pellicle film is used for extreme UV lithography. ADVANTAGE - The pellicle film has high thermal stability, high strength, thermo-mechanical property, production yield, and deflection by vacuum, and is very resistant to active hydrogen. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for manufacturing the pellicle film, which involves forming a support layer on a substrate, and forming a boron nitride nanostructure layer on the support layer.