• 专利标题:   Chemical vapor deposition integrated exhaust gas treatment equipment for graphene production, includes chemical vapor deposition tubular furnace, shunting device, condensing device, storage device, and energy conversion device.
  • 专利号:   CN205419785-U
  • 发明人:   JIANG C, WANG H, WANG Q, ZHOU Z
  • 专利权人:   SHANGHAI JINGDUN TECHNOLOGY CO LTD
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN205419785-U 03 Aug 2016 C01B-031/04 201666 Pages: 7 Chinese
  • 申请详细信息:   CN205419785-U CN21012935 09 Dec 2015
  • 优先权号:   CN21012935

▎ 摘  要

NOVELTY - This utility model new supply of chemistry gas phase deposition production of tail gas comprehensive treatment device of graphene process, including CVD tubular furnace, shunting device, used for tail gas pressure state under different production the production of graphene and shunting, condensing device, tail gas and can filter used for condensing the condensed gas, storage device, used for not can condensate storage and energy conversion device is gas, and the tail gas can fuel for the gas and power can use the conversion tail gas in the CVD tubular furnace one terminal and shunting device one end through pipeline connected with, the other end shunting device and the condensing device connected with, the other end condensing device and storage device is connected, the other end storage device and one end of energy conversion device is connected, energy conversion device the other end and auxiliary power source the CVD tubular furnace connection. The device strong practicability, high safety, at last using chemistry can the tail gas conversion for power supply assistant power source using the tubular furnace, realize circulation of tail gas again using, reasonable solves tail gas problem, reducing of environment pollute.