▎ 摘　　要

NOVELTY - The preparation method of patterned graphene involves providing insulating substrate, depositing germanium film on the insulating substrate, etching desired pattern in the germanium film using photolithographic etching process, forming patterned germanium film and then processing at high temperature, continuously evaporating at high temperature, and processing. USE - The method is useful for preparation of patterned graphene (claimed). ADVANTAGE - The method enables preparation of patterned graphene with high quality.